Nanometrics Expands Position in Advanced Memory Devices with Atlas for Thin Film Process Control

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Nanometrics Incorporated today announced that its Atlas systems have been adopted by multiple leading memory manufacturers for production control of thin film deposition processes. Complementing the large installed base of Atlas tools, the Atlas MPU and Atlas III systems are new members of a fleet of solutions that Nanometrics has deployed to enable yield learning and factory control across multiple process steps of the industry's advanced 3D-NAND and DRAM devices.

The Atlas MPU and the Altas III platforms are extensions to the widely deployed Atlas product line, delivering higher productivity and improved thin film metrology performance. Using a common platform architecture strategy, the Atlas MPU is targeted to film applications in customer fabs which have already deployed Atlas XP+ systems into high-volume manufacturing. The Atlas III provides enhanced performance and productivity over the Atlas II+ by enabling sub-angstrom level process control and film metrology capabilities suitable for the most challenging leading-edge device applications. Atlas MPU and Atlas III both leverage Nanometrics' industry-leading NanoDiffract® OCD modeling capabilities.

"The Atlas MPU and Atlas III systems for thin film metrology significantly lowers overall cost-of-ownership and increases operational flexibility within volume manufacturing," commented Dr. Srini Vedula, vice president, Thin Film & OCD Solutions, at Nanometrics. "Our customers recognize the benefit and value of extending their metrology capabilities with new platforms compatible with their existing Atlas fleet. By working closely with them on upgradable options and new system performance, the Atlas MPU and Atlas III enable our customers to maximize their existing investments in our Atlas platforms and solutions while providing significant fab-wide performance and productivity improvements."

About Nanometrics

Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs, discretes and data storage components.  Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced three-dimensional wafer-level packaging applications. Nanometrics' systems enable advanced process control for device manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO.