ZESTRON’s Water-based Cleaning Agent to be Featured at IMAPS 2018


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ZESTRON will feature HYDRON SE 200 at IMAPS 2018. HYDRON SE 220 is a pH neutral, water-based, single-phase semicon cleaning agent specifically developed for use in immersion and ultrasonic processes. HYDRON SE 220 removes flux residues from a wide range of semiconductor electronics, such as leadframes, discrete devices, power modules, power LEDs, flip chips and CMOS following the die attach process.

IMAPS 2018 will be held at the Pasadena Convention Center in Pasadena, California on October 8-11th. Stop by booth #304 and ask about our recent semicon Pulse of the Industry Survey.

About ZESTRON                                                                                         

Headquartered in Manassas, Virginia, and operating in more than 35 countries, ZESTRON is the globally leading provider of high precision cleaning products, services and training solutions for the electronics and semiconductor manufacturing industries. With eight worldwide technical centers and the largest team of engineers focused on high precision cleaning, ZESTRON’s commitment to ensuring that its customers surpass even the most stringent cleaning requirements is without equal.

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