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Indium Corporation has released IndiOx (In2O3) for use in the manufacture of ITO sputtering targets for thin-film coating. IndiOx (In2O3) is a stable ceramic-like material that is insoluble in water and volatizes at 850°C.
When doped with tin oxide, IndiOx forms ITO, the material of choice to form transparent conductive oxide (TCO) layers in flat-panel displays and touch sensors for mobile devices. The ITO layer is deposited onto glass from a sputtering target that is manufactured from the ITO powder by sintering.
Other uses for IndiOx include glass coloring, gassing suppression in alkaline batteries, and as an anti-arcing additive in high current electrical switches and contactors.
IndiOx is available in three powder types:
- Type A – Crystalline: particle size distribution D10–D90 ranges from 0.8–38μm.
- Type B – Fine: particle size distribution D10–D90 ranges from 0.5–6μm.
- Type T – Target Grade: particle size distribution D10–D90 ranges from 0.1–7.5μm. The primary particle size is about 100nm.
Indium Corporation is a premier materials manufacturer and supplier to the global electronics, semiconductor, thin-film, and thermal management markets. Products include solders and fluxes; brazes; thermal interface materials; sputtering targets; indium, gallium, germanium, and tin metals and inorganic compounds; and NanoFoil. Founded in 1934, the company has global technical support and factories located in China, India, Malaysia, Singapore, South Korea, the United Kingdom, and the USA.
For more information about Indium Corporation, visit www.indium.com.