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SEMs Examine Wide Substrate Range
August 6, 2007 |Estimated reading time: Less than a minute
HILLSBORO, Ore. FEI released its Nova NanoSEM 30 series of field-emission scanning-electron microscopes (SEMs), designed to analyze and characterize a range of materials, perform lithography and deposition prototyping, and host in-situ experimentation and testing.
The series uses low-kV performance to enhance surface characterization. A high current enables compositional analysis, and high-resolution operation in low vacuum allows users to characterize uncoated or insulating samples. The series' machines accept nanoparticle, insulating substrate such as glass and polymers, porous material, metal, and composite samples using a Schottky gun and beam-deceleration technologies for high-end SEM tasks.
The series allows researchers to perform electron-beam lithography and electron-beam-induced deposition for prototyping projects. In-situ experimentation allows manipulation and testing of given substrates and materials.
The 230 system features a 50- × 50-mm five-axis motorized stage; the 430 possesses a 100- × 100-mm stage. The 630 system uses a five-axis high-precision 150- × 150-mm piezo stage.