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Austin, Texas — Molecular Imprints Inc. (MII) announces that Motorola Labs will take delivery on the first Step and Flash Imprint Lithography (S-FILTM) system, the Imprio 100.
The Lab will use the tool to perform advanced device research in the areas of novel devices, compound semiconductors, molecular electronics, and photonic and optical devices.
The Imprio 100 is the initial product offering from MII. The tool employs Step and Flash Imprint Lithography (S-FIL) and is capable of creating sub-100 nanometer images. S-FIL is a bi-layer approach, using a low-viscosity, UV-curable liquid etch barrier deposited on an underlying transfer layer. The template is rigid and transparent, allowing for UV curing of the etch barrier and the adaptation of traditional layer-to-layer alignment techniques. This lithography approach may be the enabling technology for research applications in the areas of nano-devices, MEMS, and optical communications components and devices.
Molecular Imprints has exclusive license, for the lifetime of the patents, to develop and use S-FIL technology, which was invented at the University of Texas at Austin under the direction of Professors Grant Willson and S.V. Sreenivasan.
Designed for sub-100 nanometer features, the Imprio 100 is a lithographic tool for creating compound semiconductors, nano-devices, MEMS, photonic and optical communications components, and semiconducting devices. The system uses a simple step-and-repeat process that is said to be about one-tenth the cost of traditional projection systems. The tool is unique in that it operates in a room temperature and low-pressure environment, further reducing the overall cost of operation. This first-generation tool is manual and designed for small-volume manufacturing, R&D, and process, material and template development, and is capable of handling wafer sizes from 2" to 8".
The next-generation system, expected in 2004, will be capable of throughputs that will meet production-volume expectations.
Motorola Labs is the applied research arm of Motorola Inc., with a strong, global team of scientists and engineers focused on discovering and developing new materials, technologies, architectures, algorithms and processes for future systems, products and product enhancements. For more information, visit www.motorola.com/labs.
MII was founded in February 2001 to design, develop, manufacture and support imprint lithography systems to be used by semiconductor device manufacturers. For more information, visit www.molecularimprints.com.