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DuPont Photomasks Announces Productivity Improvements, Cost Reduction Plans
December 6, 2002 |Estimated reading time: 1 minute
Round Rock, Texas -- DuPont Photomasks Inc. plans to reduce costs, improve productivity and enhance customer service.
The company plans to streamline its European operations by consolidating trailing-edge photomask production in Rousset, France and Hamburg, Germany into its manufacturing facility in Corbeil, France. As part of these initiatives, DuPont Photomasks plans to decommission several trailing-edge production lines and relocate other equipment within its global manufacturing network.
In Europe, the company plans to produce leading-edge photomasks supporting 180-nanometer and below design rules in a new, advanced commercial production facility in Dresden, Germany, announced earlier this year. Operations in Dresden are scheduled to begin by the second quarter of fiscal 2004. The Rousset and Hamburg facilities would continue to serve as front-end regional centers for technical and sales support, critical functions required to maintain world-class customer service and on-time delivery. The company anticipates completing consolidation of the European operations within 10 months. These initiatives are expected to reduce the global workforce by approximately 8 percent, or 140 positions, once fully implemented.
Additionally, the company will reduce its global workforce by approximately 2 percent, or 30 positions, in Round Rock, Texas. These reductions will result in improved efficiencies as the company integrates the Round Rock-based employees from its commercial production facility with those from its joint venture R&D center, the DPI Reticle Technology Center LLC (RTC). The RTC has been focused on developing advanced photomask technologies since its inception in 1996 and is owned equally by DuPont Photomasks, AMD, Micron Technology and Motorola.
DuPont Photomasks is a leading global provider of microimaging solutions. The company develops and produces advanced photomasks, a key enabling technology used in the manufacture of semiconductor and other microelectronic devices; pellicles, the protective covers for photomasks; and electronic design automation (EDA) software. For more information, visit www.photomask.com.