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Shipley and Therma-Wave Announce Advanced Nano-Metrology JDA
December 30, 2002 |Estimated reading time: Less than a minute
Marlborough, Mass. and Fremont, Calif. -- Shipley Co. LLC has signed a joint development agreement with Therma-Wave Inc.
This companies plan to develop scatterometric methods to better measure 130 nm photoresist features for polysilicon gate and shallow trench applications.
Shipley Co. is a world leader in electronic materials and process innovations for advanced circuit board technology, semiconductor manufacturing and advanced packaging. For more information, visit www.shipley.com.
Therma-Wave Inc. revolutionizes process control metrology systems through proprietary products and technologies. For more information, visit www.thermawave.com.